发明名称 |
Plasma resistant coatings for plasma chamber components |
摘要 |
Plasma resistant coating materials, plasma resistant coatings and methods of forming such coatings on hardware components. In one embodiment, hardware component is an electrostatic chuck (ESC) and the plasma resistant coating is formed on a surface of the ESC. The plasma resistant coatings are formed by methods other than thermal spraying to provide plasma resistant coatings having advantageous material properties. |
申请公布号 |
US8206829(B2) |
申请公布日期 |
2012.06.26 |
申请号 |
US20080268196 |
申请日期 |
2008.11.10 |
申请人 |
SUN JENNIFER Y.;HE XIAO-MING;THACH SENH;APPLIED MATERIALS, INC. |
发明人 |
SUN JENNIFER Y.;HE XIAO-MING;THACH SENH |
分类号 |
B32B15/04;B32B17/06;C23C14/28;H05H1/24 |
主分类号 |
B32B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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