发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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申请公布号 |
US8208124(B2) |
申请公布日期 |
2012.06.26 |
申请号 |
US20060529587 |
申请日期 |
2006.09.29 |
申请人 |
LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS;ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS |
分类号 |
G03B27/42;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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