发明名称 Near field detection for optical metrology
摘要 An optical metrology tool may include a source of electromagnetic radiation having a characteristic wavelength, an objective having a central obscuration, a near field element located within the central obscuration of the objective, and an electromagnetic radiation detector coupled to the near field element. A mechanism is configured to bring the near field element into proximity to the target. A characteristic dimension of the near field element is sufficient smaller than the wavelength of the electromagnetic radiation that when the electromagnetic radiation passes through the cavity and the cavity is in sufficient proximity to the target that evanescent waves can couple energy from propagating radiation in the near-field element to the target. The detector detects an optical signal due to the evanescent waves coupling to the target.
申请公布号 US8209767(B1) 申请公布日期 2012.06.26
申请号 US20100828112 申请日期 2010.06.30
申请人 MANASSEN AMNON;KLA-TENCOR CORPORATION 发明人 MANASSEN AMNON
分类号 G02F1/01;G01J4/00 主分类号 G02F1/01
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