发明名称 |
Method of measuring a lithographic projection apparatus |
摘要 |
A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.
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申请公布号 |
US8208122(B2) |
申请公布日期 |
2012.06.26 |
申请号 |
US20090423570 |
申请日期 |
2009.04.14 |
申请人 |
STAALS FRANK;HOFMANS GERARDUS CAROLUS JOHANNUS;VAN DER LAAN HANS;MAGNUSSON SVEN GUNNAR KRISTER;ASML NETHERLANDS B.V. |
发明人 |
STAALS FRANK;HOFMANS GERARDUS CAROLUS JOHANNUS;VAN DER LAAN HANS;MAGNUSSON SVEN GUNNAR KRISTER |
分类号 |
G03B27/52;G03B27/32;G03B27/42;G03B27/54;G03B27/62;G03B27/68;G03B27/72;G03F1/00 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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