发明名称 |
Apparatus and method for surface treatment of substrate, and substrate processing apparatus and method |
摘要 |
A surface treatment apparatus of a substrate can clean a substrate surface in the air without employing a vacuum apparatus, and can remove a natural oxide film or an organic material, such as BTA, from the substrate surface without resorting to plasma cleaning. The surface treatment apparatus includes: an inert gas supply section for supplying an inert gas to the whole or part of a substrate surface to form an oxygen-blocking zone; a heating section for keeping the substrate surface at a predetermined temperature; and a cleaning gas supply section for supplying a cleaning gas to the oxygen-blocking zone to clean the substrate surface. |
申请公布号 |
US8205625(B2) |
申请公布日期 |
2012.06.26 |
申请号 |
US20070987078 |
申请日期 |
2007.11.27 |
申请人 |
TATEISHI HIDEKI;NAKADA TSUTOMU;SUSAKI AKIRA;SHIMA SHOHEI;FUKUNAGA YUKIO;EBARA CORPORATION |
发明人 |
TATEISHI HIDEKI;NAKADA TSUTOMU;SUSAKI AKIRA;SHIMA SHOHEI;FUKUNAGA YUKIO |
分类号 |
B08B5/00;B08B13/00 |
主分类号 |
B08B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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