APPARATUS FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to prevent the loss of reactive power by preventing a source supply line from overheating. CONSTITUTION: A susceptor(150) supports a substrate(10) while being arranged inside a chamber(110). A heating coil(171) heats the susceptor. A plurality of power supply lines(180) supplies power to the heating coil. A power block(173) transfers a current provided along the power supply line to the heating coil. A shower head(130) uniformly sprays a gas provided from a gas supply part(140) to the inside of the chamber.