SUSCEPTOR AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME

摘要

PURPOSE: A substrate support and a substrate processing apparatus including the same are provided to prevent a substrate from being separated from a supporting plate by arranging a guide pin around a substrate. CONSTITUTION: A chamber(10) includes a space part(11) inside thereof. A slot(12) for carrying in and out a substrate is formed at the side of the chamber. A gas ejector(20) sprays a process gas to the substrate. A substrate support(30) supports the substrate. The substrate support includes a supporting plate(31) and a guide pin(32).