VACUUM PROCESSING APPARATUS

摘要

PURPOSE: A vacuum processing apparatus is provided to uniformly distribute plasma in a vacuum chamber by locally laminating a high permittivity dielectric film on a seating area of a high frequency antenna from whole area of a dielectric window. CONSTITUTION: A vacuum chamber(110) includes a processing space performing various kinds of processes including etching or deposition of a substrate(10). A dielectric window(120) is arranged on an upper opening of the vacuum chamber. The dielectric window transfers high frequency power to the inside of the vacuum chamber with a high frequency antenna(130) while vacuum or decompression of the vacuum chamber is maintained. The high frequency antenna is arranged on the top of the dielectric window. A high permittivity dielectric film(140) is locally laminated on a seating area of the high frequency antenna in the dielectric window in order to uniformly generate plasma inside the vacuum chamber.