发明名称 THIN LAYER DEPOSITION APPARATUS
摘要 PURPOSE: An apparatus for depositing a thin film is provided to simultaneously load and unload a cassette as well as open and close a processing chamber by integrating a door and a cassette holder which opens and closes the processing chamber. CONSTITUTION: An opening portion is formed on one side of an external chamber(10). A processing chamber(20) deposits an atomic layer on a substrate by housing a cassette(C). A first door(21) opens and closes the opening portion of the processing chamber. A second door(11) opens and closes the opening portion of the external chamber. A cassette holder(30) loading a plurality of cassettes is located on an inner wall of the first door.
申请公布号 KR20120066853(A) 申请公布日期 2012.06.25
申请号 KR20100128158 申请日期 2010.12.15
申请人 NCD CO. 发明人 SHIN, WOONG CHUL;BAEK, MIN;CHOI, KYU JEONG
分类号 H01L21/205 主分类号 H01L21/205
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