发明名称 |
THIN LAYER DEPOSITION APPARATUS |
摘要 |
PURPOSE: An apparatus for depositing a thin film is provided to simultaneously load and unload a cassette as well as open and close a processing chamber by integrating a door and a cassette holder which opens and closes the processing chamber. CONSTITUTION: An opening portion is formed on one side of an external chamber(10). A processing chamber(20) deposits an atomic layer on a substrate by housing a cassette(C). A first door(21) opens and closes the opening portion of the processing chamber. A second door(11) opens and closes the opening portion of the external chamber. A cassette holder(30) loading a plurality of cassettes is located on an inner wall of the first door.
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申请公布号 |
KR20120066853(A) |
申请公布日期 |
2012.06.25 |
申请号 |
KR20100128158 |
申请日期 |
2010.12.15 |
申请人 |
NCD CO. |
发明人 |
SHIN, WOONG CHUL;BAEK, MIN;CHOI, KYU JEONG |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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