发明名称 New metal-organic precursor material and fabrication method of metal thin film using the same
摘要 Provided are an organic-metal precursor material that can be readily decomposed without reacting with an oxidant, a method of manufacturing a metal thin film using the organic-metal precursor material, and a metal thin film prepared using the organic-metal precursor material. The organic-metal precursor material is an organic molecule having lone-pair electrons selected from the group consisting of ether, amine, tetrahydrofuran (THF), a phosphine group, and a phosphite group, and has a structure of covalent coordination bond.
申请公布号 KR101159073(B1) 申请公布日期 2012.06.25
申请号 KR20050088714 申请日期 2005.09.23
申请人 发明人
分类号 C07F15/00 主分类号 C07F15/00
代理机构 代理人
主权项
地址