PROCESSING APPARATUS FOR LARGE AREA SUBSTRATE

摘要

PURPOSE: An apparatus for processing a large substrate is provided to prevent a substrate from being damaged by preventing interference with other apparatuses. CONSTITUTION: An external wall includes a substrate gateway(100) for loading and unloading a large substrate(S). A plurality of racks(220-240) support the large substrate. A top transfer guide(110) guides the plurality of racks. A supply unit(300) supplies the large substrate supported by the rack to a processing chamber(500). A discharge unit(400) discharges the large substrate from the processing chamber to the rack.