| 摘要 |
PURPOSE: Etchant and an etching method using the same are provided to selectively etch a copper layer in an object comprising an oxide layer and the copper layer. CONSTITUTION: Etchant is used for etching an object comprising a copper layer and a metal oxide layer including metal oxide of one or more selected from Zn, Sn, Al, In, and Ga. The etchant is a solution which comprises 0.1-3.0 weight% of copper ion as a second copper ion source, 0.1-30.0 weight% of organic acid with a carbon number of 6 weight% or less, and 0.1-3.0 weight% of one or more nitrogen-containing compounds selected from the group consisting of heterocyclic compounds having two or more nitrogen atoms in a loop and amino-containing compounds. The Ph of the solution is 5.0-10.5.
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