| 摘要 |
<p>[Object] To provide a substrate processing method capable of forming a concavo-convex structure on a substrate surface while reducing the number of processes. [Solving Means] In a substrate processing method according to the present invention, particles (11) are dispersed on a surface (10s) of a substrate (10), and a concavo-convex structure (12) is formed on the surface of the substrate by etching the surface of the substrate with the particles as a mask and the mask (11) is simultaneously removed by the etching. According to this method, a process of removing the mask (11) from the substrate surface (10s) after the concavo-convex structure (12) is formed becomes unnecessary. Accordingly, since the number of processes necessary to form the concavo-convex structure on the substrate surface is largely reduced, it becomes possible to greatly improve productivity.</p> |
