发明名称 |
METHOD FOR PREPARING POLYSILAZANE SOLUTION AND POLYSILAZANE SOLUTION PREPARED BY THE SAME |
摘要 |
PURPOSE: A manufacturing method of polysilazane solution is provided to reduce volume contraction ratio at converted to a silicon oxide layer because of low contraction ratio when used as a coating solution for filling semiconductor gap, thereby minimizing the generation of tensile stress, to restrain the generation of void and delamination. CONSTITUTION: A manufacturing method of polysilazane solution comprise: a step of manufacturing mixed solution by mixing halosilane into a mixed solvent comprising inactive solvent and basic solvent; a step of manufacturing reactive solution by reacting ammonia added into the mixed solution and the halosilane; a step of manufacturing reaction filtrate by removing salt from the reactive solution. The manufacturing method additionally comprises a step of putting ammonia into after one step selected from the steps.
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申请公布号 |
KR20120066389(A) |
申请公布日期 |
2012.06.22 |
申请号 |
KR20100127707 |
申请日期 |
2010.12.14 |
申请人 |
SOULBRAIN CO., LTD. |
发明人 |
PARK, YONG JOO;JUNG, JAE SUN;LEE, SANG KYUNG;YOO, CHANG JIN;PARK, YOUNG HWAN |
分类号 |
C08L83/04;C08G77/06 |
主分类号 |
C08L83/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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