| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem wherein, when a conventional resist composition containing an acid generator is used as an electron beam resist composition, the resolution of a resulting resist pattern is not always sufficiently satisfactory. <P>SOLUTION: The salt is represented by formula (I), wherein Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represents a fluorine atom or the like, L<SP POS="POST">1</SP>represents a 1-17C divalent saturated hydrocarbon group or the like; W represents a 3-36C aliphatic ring; s denotes an integer of 0-3; t denotes an integer of 0-2; R<SP POS="POST">1</SP>represents a 1-18C aliphatic hydrocarbon group or the like; R<SP POS="POST">2</SP>represents a hydrogen atom or the like; and Z+ represents an organic ion pair. <P>COPYRIGHT: (C)2012,JPO&INPIT |
