| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having excellent sensitivity and developing solution resistance, from which an interlayer insulating film excellent in solvent resistance, heat resistance and transparency can be formed, and to provide an interlayer insulating film formed of the radiation-sensitive resin composition and a method for forming the interlayer insulating film. <P>SOLUTION: The radiation-sensitive resin composition contains: [A] an alkali-soluble resin having a carboxyl group; [B] a quinone diazide compound; and [C] a copolymer prepared by copolymerizing an epoxy group-containing unsaturated compound with at least one kind of unsaturated compound selected from the group consisting of an alkyl ester of (meth)acrylic acid, a fluorinated alkyl ester of (meth)acrylic acid and a (meth)acrylic acid ester having a siloxane structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
