| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymerizable composition which has high light-shielding properties in an infrared region and high translucency in a visible light region, and with which a pattern having excellent resolution in alkali development can be formed, as well as photosensitive layer, a permanent pattern, a wafer level lens, a solid state imaging element and a pattering method using the composition, and additionally if a substrate with a photosensitive layer provided thereon has an uneven shape, to provide a polymerizable composition with which a photosensitive layer satisfactorily conforming to the uneven shape of the substrate can be formed, as well as a photosensitive layer, a permanent pattern, a wafer level lens, a solid state imaging element and a pattering method using the composition. <P>SOLUTION: A polymerizable composition contains a polymerization initiator, a polymerizable compound, a tungsten compound, an alkali-soluble binder and an inorganic filler. <P>COPYRIGHT: (C)2012,JPO&INPIT |
