| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask capable of suppressing the position shift of a focus due to a level difference even in a substrate with a level difference on the surface. <P>SOLUTION: The photomask includes a transparent substrate 1 having one pair of principal surfaces, a light-shielding film 7 which is disposed on one of the principal surfaces of the transparent substrate and has a first opening 71 and a second opening 72, and a light condensing structure L1 which is disposed in the first opening 71 on one of the principal surfaces of the transparent substrate 1 and has a convex lens surface on the opposite side of the transparent substrate 1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
