Method for producing reflective optical element for extreme ultraviolet lithography, involves providing substrate and applying polishing layer in environment that contains volatile substance

摘要

The method involves providing a substrate (11) and applying a polishing layer (12) in an environment that contains a volatile substance. The polishing layer is polished by exposure to noble gas ions and a multilayer system (13) is applied on the polishing layer. The polishing layer is made from silicon, a silicon oxide, carbon, germanium, or a metallic glass.