AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD
摘要
<p>An aqueous dispersion for chemical mechanical polishing relating to the present invention is characterized in comprising: (A) abrasive grains; (B) a polyvalent carboxylic acid compound in which the total fat chain length present between carboxyl groups is 9 carbons or greater; and (C) an anionic surfactant.</p>
