| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a slippage prevention solution of a patterning device which can function under high acceleration. <P>SOLUTION: A structure for substantially eliminating slippage of a patterning device 270 during the movement of a patterning device stage of a lithography apparatus is provided. One of such configuration includes a holding system and a support transport device 230. The holding system includes a support device 250, a holding device 280, and a magnetostrictive actuator 260. The holding device 280 is configured to releasably couple the patterning device 270 to the support device 250. The magnetostrictive actuator 260 is configured to be releasably coupled to the patterning device 270 to provide an accelerating force to the patterning device 270. The support transport device 230 is configured to be coupled to the support device 250 and arranged to move the support device 250 concurrently with the magnetostrictive actuator 260 providing the force to the patterning device so as to prevent slippage of the patterning device 270. <P>COPYRIGHT: (C)2012,JPO&INPIT |
