| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide substrate processing equipment capable of obtaining uniform quality of substrates to be treated by preventing electrodes from shrinking and particles from being generated. <P>SOLUTION: Substrate processing equipment comprises: a processing chamber for storing a plurality of substrates being stacked; a heating unit provided around an outer periphery of the processing chamber, for heating a height region of the stacked substrates; a gas supply unit for supplying a treatment gas to the processing chamber; a gas exhaust unit for exhausting an atmosphere in the processing chamber; at least a pair of electrodes to which high-frequency power is applied for activating the treatment gas; and storage tubes each for storing each of the pair of electrodes in a state where at least one portion of the electrode is curved. The electrodes each comprise: a core wire made of metal; a plurality of first tube bodies connected with each other by the core wire in a bendable manner, and provided at a position corresponding to the height region of the stacked substrates; and a plurality of second tube bodies made of quartz, connected with each other by the core wire in a bendable manner, and provided at a position lower than the height region of the stacked substrates. <P>COPYRIGHT: (C)2012,JPO&INPIT |
