| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device to improve defects in vacuum absorption by forming a groove part on a photo mask such that the groove part absorbs a bubble generated in a crimping process between the photo mask and a body to be transferred in the exposure device. <P>SOLUTION: An exposure device includes: a photo mask 100 comprising a transparent substrate 111, a light shielding film 112 formed on the transparent substrate 111 and having a light absorption pattern formed thereon, a silicon layer 114 formed on the light shielding film 112 and contacting with one surface of a body to be transferred 130, and a groove part 150 formed by inscribing from the silicon layer 114 to an inner part of the light shielding film 112; and a support medium 120 to support the other surface of the body to be transferred 130. <P>COPYRIGHT: (C)2012,JPO&INPIT |
