| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a developing device which is capable of forming a pattern within a substrate surface with a high uniformity. <P>SOLUTION: A developing device comprises: a substrate holding unit for horizontally holding a substrate, of which a surface has been coated with a resist and exposed; a developing solution supply unit for supplying a developing solution to the surface of the substrate and developing the resist; a radiant light irradiation unit which irradiates a preset certain region on the substrate with radiant light containing a wavelength absorption region of a material of the substrate in order to heat the developing solution and enhance the degree of reaction between the developing solution and the resist; and a cleaning liquid supply unit for supplying a cleaning solution to the surface of the substrate to remove the developing solution. <P>COPYRIGHT: (C)2012,JPO&INPIT |
