发明名称 FLUOROALCOHOL CONTAINING MOLECULAR PHOTORESIST MATERIALS AND PROCESSES OF USE
摘要 Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
申请公布号 WO2012079919(A1) 申请公布日期 2012.06.21
申请号 WO2011EP70579 申请日期 2011.11.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;DE SILVA, EKMINI, ANUJA;SUNDBERG, LINDA, KARIN;SOORIYAKUMARAN, RATNAM;BREYTA, GREGORY;BOZANO, LUISA, DOMINICA;HINSBERG, WILLIAM 发明人 DE SILVA, EKMINI, ANUJA;SUNDBERG, LINDA, KARIN;SOORIYAKUMARAN, RATNAM;BREYTA, GREGORY;BOZANO, LUISA, DOMINICA;HINSBERG, WILLIAM
分类号 C07C39/367;G03F7/004;G03F7/038;G03F7/039 主分类号 C07C39/367
代理机构 代理人
主权项
地址