发明名称 METHOD OF REDUCING LASER-INDUCED DAMAGE IN FORMING LASER-PROCESSED CONTACTS
摘要 A method for manufacturing a photovoltaic cell comprises depositing a passivation layer and a dielectric layer, or a dielectric passivation layer, on at least one surface of a silicon semiconductor wafer; depositing a doping layer on a region of at least one of the surfaces of the wafer; depositing an electrical contact Iayer comprising a metal over at least the dielectric layer or the dietectric passivation Iayer in the region containing the doping Iayer; and spatially and/or temporally pulse-shaping a laser beam directed at the surface of the wafer to form localized base and/or emitter contacts with a greatly reduced amount of laser-induced damage.
申请公布号 WO2012054426(A3) 申请公布日期 2012.06.21
申请号 WO2011US56632 申请日期 2011.10.18
申请人 BP CORPORATION NORTH AMERICA INC.;CARLSON, DAVID, E.;ZOU, LIAN;REN, WENGSHENG;MORILLA, CARMEN 发明人 CARLSON, DAVID, E.;ZOU, LIAN;REN, WENGSHENG;MORILLA, CARMEN
分类号 H01L31/00 主分类号 H01L31/00
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