| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a shape measurement device capable of highly precisely measuring the pattern shape and defect on a substrate applied with microfabrication. <P>SOLUTION: The shape measurement device includes: an irradiation part 10 which irradiates a pattern region to be tested on a reflection type sample substrate 2 with coherent light in a space area and/or a time domain a plurality of times while shifting an irradiation position; an imaging element 15 which receives diffraction light from the pattern region to be tested irradiated by the irradiation part 10; a recording part 16a which records image information being the result of the light reception by the imaging element 15; and a measuring processing part 16 which extracts the pattern shape and defect in actual wavelength by deriving an illumination shape most suitable for calculation from the image information recorded at the recording part 16a by a repeated computation, and using the derived illumination shape out of the image information recorded at the recording part 16a. <P>COPYRIGHT: (C)2012,JPO&INPIT |
