发明名称 PLASMA PROCESSING APPARATUS
摘要 PURPOSE: A plasma processing device is provided to facilitate maintenance and repair processes by separating a top electrode unit. CONSTITUTION: A top electrode unit(10) includes a top plate(11), a gas spray plate(12), and a power applying unit(30). A heater installing unit(14) includes a heater for heating a top electrode unit. A shower head(13) is combined with the lower side of the gas spraying plate for spraying gas. A bolt(35) passes through a bolt hole(35a) of a first connector(31) and is combined with the combination groove of the top plate. A protrusion unit(31a) of the first connector is combined with a groove unit(32a) of a second connector.
申请公布号 KR20120065625(A) 申请公布日期 2012.06.21
申请号 KR20100126851 申请日期 2010.12.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LIM, YOUNG HO;LEE, JU HYUN;LEE, JIN SEOK;PARK, YOUNG MIN
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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