EXHAUST GAS TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exhaust treatment apparatus capable of cleaning gas exhausted from a semiconductor manufacturing apparatus.

SOLUTION: The exhaust gas treatment apparatus 1 includes: a chamber 10 storing a liquid 31 therein; a gas inlet 20 and a gas discharge port 50 provided facing to a space formed above a liquid surface of the liquid stored in the chamber; a gas passage 40 demarcated by a partition wall part 30 provided in the chamber and communicating with the gas inlet and the gas discharge port ; a gas discharge passage 51 connected to the gas discharge port, and through which the gas discharged from the chamber passes; and a discharge unit interposed in a gas discharge passage and exhausting the inside of the chamber. The exhaust gas treatment apparatus includes a circulation passage 60 branching from downstream side of the discharge unit of the gas discharge passage and communicating with one end side of the gas discharge passage.

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