| 发明名称 |
HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN |
| 摘要 |
A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1:
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| 申请公布号 |
US2012153424(A1) |
申请公布日期 |
2012.06.21 |
| 申请号 |
US201113241332 |
申请日期 |
2011.09.23 |
| 申请人 |
OH SEUNG-BAE;CHEON HWAN-SUNG;CHO SUNG-WOOK;KIM MIN-SOO;SONG JEE-YUN;CHOI YOO-JEONG |
发明人 |
OH SEUNG-BAE;CHEON HWAN-SUNG;CHO SUNG-WOOK;KIM MIN-SOO;SONG JEE-YUN;CHOI YOO-JEONG |
| 分类号 |
H01L21/306;C09D185/02;H01L27/02 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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| 主权项 |
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