| 摘要 |
<p>In a multibeam-type charged particle applied apparatus, image rotation and magnification changes give rise to fluctuations in multibeam arrangement, i.e. fluctuations in the field of view of respective beams, and it becomes difficult to freely control irradiation conditions, such as incident energy and the amount of current irradiated onto a sample. Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam- forming section (108) that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section (108) comprises a beam splitting electrode (302), a lens array upper electrode (303a), a lens array middle electrode (303b), a lens array lower electrode (303c) and a movable stage (307), and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage (307), of a plurality of aperture pattern sets (304a to c).</p> |
