PHOTORESIST STRIPPING SOLUTION COMPOSITION FOR MANUFACTURING LIQUID CRYSTAL DISPLAY, INCLUDING PRIMARY ALKANOL AMINE

摘要

PROBLEM TO BE SOLVED: To provide an aqueous photoresist stripping agent, which maintains a certain level of abilities of preventing corrosion in Cu and Al and of stripping a photoresist even when a water content varies, by using an azole compound containing a mercapto group as a corrosion preventive, the compound being an additive for a TFT-LCD stripping solution composition.

SOLUTION: The photoresist stripping solution composition for manufacturing a LCD contains: (a) 1 to 20 wt.% of a primary alkanol amine; (b) 10 to 60 wt.% of alcohol; (c) 0.1 to 50 wt.% of water; (d) 5 to 50 wt.% of a polar organic solvent; and (e) 0.01 to 3 wt.% of a corrosion preventive.

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