发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER |
摘要 |
A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7. |
申请公布号 |
US2012156612(A1) |
申请公布日期 |
2012.06.21 |
申请号 |
US201113325056 |
申请日期 |
2011.12.14 |
申请人 |
ASANO YUUSUKE;KAWAKAMI TAKANORI;JSR CORPORATION |
发明人 |
ASANO YUUSUKE;KAWAKAMI TAKANORI |
分类号 |
G03F7/20;C07C69/54;C08F220/10;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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