| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that produces a resist pattern with an excellent focus margin, and to provide a resin etc. useful for the resist composition. <P>SOLUTION: The following (1) and (2) are provided: (1) a resin having a structural unit represented by formula (aa) and a compound which induces the structural unit; and (2) a resist composition containing the resin, an acid generator, and a solvent. In formula (aa), T<SP POS="POST">1</SP>represents a 4-34C sultone ring group which may have a substituent, R<SP POS="POST">a</SP>represents a hydrogen atom or a 1-6C alkyl group, and Z<SP POS="POST">1</SP>represents *-X<SP POS="POST">1</SP>-CO-, provided that X<SP POS="POST">1</SP>represents a 1-6C aliphatic hydrocarbon group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
