| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed therein, the macro inspection apparatus being capable of detecting abnormalities in dimension and size with high sensitivity. <P>SOLUTION: The inspection apparatus for a sample having a pattern formed therein comprises: an illumination optical system for illuminating the sample having a pattern formed therein with light; a detection optical system for receiving scattered light of the pattern; an image pickup device which is arranged on a pupil surface of the detection optical system and images a Fourier image of the pattern; and a processing unit for comparing the Fourier image to a Fourier image with a normal pattern and detecting an abnormality of the pattern. <P>COPYRIGHT: (C)2012,JPO&INPIT |
