发明名称 |
PREPARATION OF CERIUM-CONTAINING PRECURSORS AND DEPOSITION OF CERIUM-CONTAINING FILMS |
摘要 |
Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using deposition methods such as chemical vapor deposition or atomic layer deposition. The disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and an amidine ligand. |
申请公布号 |
US2012156373(A1) |
申请公布日期 |
2012.06.21 |
申请号 |
US201113328586 |
申请日期 |
2011.12.16 |
申请人 |
PALLEM VENKATESWARA R.;DUSSARRAT CHRISTIAN;NOH WONTAE;AMERICAN AIR LIQUIDE, INC. |
发明人 |
PALLEM VENKATESWARA R.;DUSSARRAT CHRISTIAN;NOH WONTAE |
分类号 |
C23C16/06;C07F5/00;C23C16/00;H01L21/31 |
主分类号 |
C23C16/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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