NOZZLE CLEANING APPARAATUS AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

摘要

PURPOSE: A nozzle cleaning device and a substrate processing device including the same are provided to prevent an accident and the degradation of quality by removing the remaining resist solutions around an outlet of a nozzle using air bubbles of ultrasonic waves. CONSTITUTION: A bath(70a) receives mediums. A sub tube is located in one side of the bath to control the level of the mediums. A bath supporting unit(70b) supports the bath. A vibration cable(70c) provides vibration due to ultrasonic waves to the bath. A medium providing pipe provides the mediums to the bath.