<p>An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.
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申请公布号
EP1803503(A3)
申请公布日期
2012.06.20
申请号
EP20060256392
申请日期
2006.12.15
申请人
LAM RESEARCH CORPORATION
发明人
FREER, ERIK M.;DE LARIOS, JOHN M.;MIKHAYLICHENKO, KATRINA;THOMAS, CLINT;PARKS, JOHN;RAVKIN, MICHAEL;KOROLIK, MIKHAIL;REDEKER, FRED C.