| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming monomolecular film which makes it possible to form a homogeneous monomolecular film in an arbitrary range from a large area to a micro region on the surface of a substrate of silicon, diamond, germanium, silicon carbide and the like , capable of hydrogen termination, and makes it possible to form a plurality of the kinds of monomolecular films on prescribed spots with prescribed patterns and form a two-dimensional array structure. SOLUTION: In the method for forming monomolecular film, a substance having unsaturated bond such as 1-octadecene is applied on the surface of the hydrogen-terminated substrate and is heated in the environment of non-oxygen atmosphere having a temperature of 40 to 200°C, and, thereby, the monomolecular film is formed on the surface of the substrate. The formation of large-area and micro-structure of the monomolecular covering and, further, the formation of two-dimensional array can be performed on the same substrate through an extremely simple process. COPYRIGHT: (C)2005,JPO&NCIPI |
