发明名称 SYSTEM AND METHOD FOR ELECTROLYTIC PLATING
摘要 <p>The present invention includes an electrolytic plating system with an elecrolytic plating bath, means for positioning the printed circuit boards in the bath, and means to alternately generate a laminar flow of electrolyte on each side of the printed circuit boards. A preferred means to alternately generate a laminar flow of electolyte comprises a floating shield with a venturi-shaped partition and an aligned partition below the printed circuit boards, and operating a plurality of eductors below the floating shield. The means to alternately generate a laminar flow of electolyte can further comprise a transport mechanism that moves the floating shield and its partitions from side to side relative to the eductors or a mechanism to move the eductors. The plating can be also be improved by using a vibrator and a spring-mounting system that prevents vibration energy being absorbed by fixed portions of the plating system.</p>
申请公布号 EP1438446(B1) 申请公布日期 2012.06.20
申请号 EP20020786452 申请日期 2002.10.21
申请人 VIASYSTEMS GROUP, INC. 发明人 KEMPEN, HEIN, VAN
分类号 C25D5/02;C25D5/08;C25D7/00;C25D17/00;C25D17/06;C25D21/10;H05K3/00;H05K3/18;H05K3/42 主分类号 C25D5/02
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