Process of preparing a chemical amplification type resist composition

摘要

A chemical amplification type resist composition comprising a polymer having a molecular weight dispersity of 1.0 to 1.5 selected from the group consisting of a polymer comprising recurring units of formula (1) and recurring units of formula (2), a polymer comprising recurring units of formula (2), a polymer comprising recurring units of formula (2) and recurring units of formula (4), a polymer comprising recurring units of formula (3), and a polymer comprising recurring units of formula (4), <CHEM> wherein R<1> is an alkyl, alkoxyalkyl, acetyl or carbonyl-alkoxy group, each unit may be of one type or a mixture of at least two types, p is a positive number, q is 0 or a positive number, satisfying 0 <p/(p+q) ≤ 1, <CHEM> wherein R<2> is hydrogen or methyl, and R<3> is a tertiary hydrocarbon group of 4 to 30 carbon atoms, <CHEM> wherein R<4> is a tertiary hydrocarbon group of 4 to 30 carbon atoms, R<5> to R<8> are independently selected from the group consisting of a hydrogen atom, ester group, alkoxycarbonylalkyl group, lactone group, carboxyl group, and cyclic acid anhydride group, or two of R<5> to R<8>, taken together, may form a cyclic lactone group or acid anhydride group, r is a positive number, s is 0 or a positive number, satisfying 0 <r/(r+s) ≤ 1, <CHEM> wherein R<9> is a tertiary hydrocarbon group of 4 to 30 carbon atoms, and n is equal to 0 or 1.