| 摘要 |
An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate to form a liquid immersion area AR2 on a part of the substrate. The liquid supply mechanism supplies the liquid 1 onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings. |
