发明名称 High efficiency electrostatic chuck assembly for semiconductor wafer processing
摘要 The present invention generally provides a high efficiency electrostatic chuck including a flex stack having an electrode disposed between two layers of dielectric material. At least one of the layers is a standard or high purity thermoplastic film. The flex stack may have a matte finish on the substrate supporting surface to provide benefits such as improved temperature distribution across the surface of the chuck. The non-substrate supporting or pedestal receiving side of the flex stack may be plasma treated to provide a desired surface finish, which is then bonded to a pedestal using an acrylic or epoxy adhesive resulting in superior bonding strength compared to traditional polymer electrostatic chucks. The electrode may be a sheet electrode on a release liner, which enables ease of manufacturing.
申请公布号 EP2466633(A1) 申请公布日期 2012.06.20
申请号 EP20110178926 申请日期 2011.08.25
申请人 APPLIED MATERIALS, INC. 发明人 BHATNAGAR, ASHISH;AGARWAL, MONIKA;GOPALAKRISHNAN, PADMA;MARTIN, DANIEL
分类号 H01L21/683;C23C14/50;C23C16/458;H01L21/67;H02N13/00 主分类号 H01L21/683
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