| 发明名称 |
METHOD OF PRODUCTION OF ELECTROINSULATING GLASS ENAMEL |
| 摘要 |
FIELD: metallurgy. ^ SUBSTANCE: frit of the following composition, wt % is melted: SiO2- 20.0-25.0; CaO- 4.5-12.0; SrO-1.0-2.0; CdO- 2.0-3.0; MnO- 0.1-0.5; K2O - 3.0-4.0; Na2O-1.0-1.5; B2O3- 5.0-5.5; CaF2-4.0-5.0; MoO3 - 0.5-0.8; Cr2O3 -0.5-0.8; Co2O3 -0.1-0.5; NiO - 0.1-1.0; Na3AlF6 - 0.1-0.5; BaO is the rest. Melting is carried out at 1150-1200 C. The obtained product is crushed, and then injected 5-10% SrTiO3 of the frit weight. ^ EFFECT: increased dielectric permeability. ^ 1 ex, 3 tbl |
| 申请公布号 |
RU2453514(C1) |
申请公布日期 |
2012.06.20 |
| 申请号 |
RU20100144078 |
申请日期 |
2010.10.28 |
| 申请人 |
GOSUDARSTVENNOE OBRAZOVATEL'NOE UCHREZHDENIE VYSSHEGO PROFESSIONAL'NOGO OBRAZOVANIJA "ROSSIJSKIJ KHIMIKO-TEKHNOLOGICHESKIJ UNIVERSITET IM. D.I. MENDELEEVA" (RKHTU IM.D.I. MENDELEEVA) |
发明人 |
SEMIN MIKHAIL ALEKSANDROVICH;NOVOSELOVA POLINA NIKOLAEVNA |
| 分类号 |
C03C8/20 |
主分类号 |
C03C8/20 |
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