| 摘要 |
The invention provides a detergent for lithography with excellent solubility and removing property for a resist or the like. The detergent for lithography contains as essential components, (a1) monopropyleneglycol monoalkylether having a >=2C alkyl group, (a2) monopropyleneglycol dialkylether, (a3) di- or tri-propyleneglycol alkylether, (a4) mono-, di- or tripropyleneglycol arylether, (a5) alkyl ether of 1,3-butanediol or glycerin, (b1) [alpha]-type monopropyleneglycol alkylether acetate having a >=2C alkyl group, (b2) di- or tripropyleneglycol alkylether acetate, (b3) mono-, di- or tripropyleneglycol arylether acetate, (b4) alkyl ether acetate of 1,3-butanediol or glycerin, and (b5) 3-4C alkanepolyol acetate. |
