| 摘要 |
A method of manufacturing a titanium-containing sputtering target is disclosed, with the method being capable of reducing the frequency of occurrence of abnormal discharge caused by lattice defects. A first metal powder containing a high melting point metal and a second metal powder containing titanium are manufactured. Subsequently, a mixed powder of the first metal powder and the second metal powder is sintered at a temperature of 695� C. or higher, and then heat-treated at a temperature of 685� C. or lower. After the sintering, the sintered body is heat-treated at a temperature of 685� C. or lower, thereby decreasing plate-like structures (lattice defects) in a sintered phase. Accordingly, it is possible to obtain a titanium-containing sputtering target with which abnormal discharge occurs less frequently. |
