发明名称 |
Sub-segmented alignment mark arrangement |
摘要 |
An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence in a first direction. An overall pitch of the periodic structure is equal to a sum of a width of the first element and a width of the second element in the first direction. Each first element has a first periodic sub-structure with a first sub-pitch and each second element has a second periodic sub-structure with second sub-pitch. An optical property of the first element for interaction with a beam of radiation having a wavelength λ is different from the optical property of the second element. The overall pitch is larger than the wavelength λ, and each of the first and the second sub-pitch is smaller than the wavelength. |
申请公布号 |
US8203692(B2) |
申请公布日期 |
2012.06.19 |
申请号 |
US20090482770 |
申请日期 |
2009.06.11 |
申请人 |
MUSA SAMI;VAN HAREN RICHARD JOHANNES FRANCISCUS;LALBAHADOERSING SANJAYSINGH;ASML NETHERLANDS B.V. |
发明人 |
MUSA SAMI;VAN HAREN RICHARD JOHANNES FRANCISCUS;LALBAHADOERSING SANJAYSINGH |
分类号 |
G03B27/68;G03B27/42 |
主分类号 |
G03B27/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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