<p>PURPOSE: A method for manufacturing a solar cell is provided to improve a contact feature of an electrode by preventing a surface of a semiconductor layer from being damaged by using etchant. CONSTITUTION: A dopant doped layer(130) is formed by diffusing dopant on an amorphous silicon layer. A semiconductor layer(120) is formed by eliminating the remaining dopant. The surface of the semiconductor layer is etched by using etchant. A first electrode is formed on the semiconductor layer. A second electrode is formed on a second side of a light absorption layer(110).</p>
