发明名称 |
CHLORINE DOPPED ZINC TIN OXIDE THIN FILM TRANSISTOR AND THE MANUFACTURING METHOD |
摘要 |
<p>PURPOSE: A zinc tin oxide thin film transistor doped with chlorine and a manufacturing method thereof are provided to reduce the movement of a threshold voltage by forming an active layer doped with a halogen group element in a printing method. CONSTITUTION: A gate electrode is formed on a substrate. A gate insulating layer is formed on the gate electrode. An active layer of a zinc tin oxide doped with chlorine is formed on the gate insulating layer. A source electrode and a drain electrode are formed on the active layer. The active layer is formed by a printing method.</p> |
申请公布号 |
KR20120064256(A) |
申请公布日期 |
2012.06.19 |
申请号 |
KR20100125404 |
申请日期 |
2010.12.09 |
申请人 |
UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY |
发明人 |
JANG, JIN;CHRISTOPHE AVIS;CHOI, MIN HEE |
分类号 |
H01L29/786;G02F1/136 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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