发明名称 CHLORINE DOPPED ZINC TIN OXIDE THIN FILM TRANSISTOR AND THE MANUFACTURING METHOD
摘要 <p>PURPOSE: A zinc tin oxide thin film transistor doped with chlorine and a manufacturing method thereof are provided to reduce the movement of a threshold voltage by forming an active layer doped with a halogen group element in a printing method. CONSTITUTION: A gate electrode is formed on a substrate. A gate insulating layer is formed on the gate electrode. An active layer of a zinc tin oxide doped with chlorine is formed on the gate insulating layer. A source electrode and a drain electrode are formed on the active layer. The active layer is formed by a printing method.</p>
申请公布号 KR20120064256(A) 申请公布日期 2012.06.19
申请号 KR20100125404 申请日期 2010.12.09
申请人 UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY 发明人 JANG, JIN;CHRISTOPHE AVIS;CHOI, MIN HEE
分类号 H01L29/786;G02F1/136 主分类号 H01L29/786
代理机构 代理人
主权项
地址