发明名称 Integrated circuit system with recessed through silicon via pads and method of manufacture thereof
摘要 A method of manufacture of an integrated circuit system includes: providing a substrate with a face surface having a via therein and a back surface having a trench therein; filling the via with a conductive pillar; forming a recessed contact pad in the trench; filling the recessed contact pad partially with solder; and forming an under-bump metal having a base surface in electrical contact with the conductive pillar, and having sides that extend away from the face surface of the substrate and further extend beyond the base surface.
申请公布号 US8202797(B2) 申请公布日期 2012.06.19
申请号 US20100820491 申请日期 2010.06.22
申请人 CHI HEEJO;CHO NAMJU;SHIN HANGIL;STATS CHIPPAC LTD. 发明人 CHI HEEJO;CHO NAMJU;SHIN HANGIL
分类号 H01L21/44 主分类号 H01L21/44
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